Solid State Technology Magazine June 2011

solid state technology magazine june 2011 coverSolid State Technology magazine for June 2011 edition has been released. You can read latest information on process, equipment and materials technologies for semiconductor and thin-film device and microstructure manufacturing in this issue. Here are feature articles for this month.

Cover Article
High-productivity materials development for post-via etch residue removers
Utilizing a high-productivity combinatorial technique, the best formulation and process window for post-via etch residue removers was determined. Rekha Rajaram, et al., Intermolecular Inc.; Barry Chen, et al.,ATMI, Inc., Danbury, CT and Round Rock, TX

450mm Wafer Transition
450mm wafer transition needs collaboration and standards
As the global supply chain deals with wafer size transition, pre-competitive collaboration will continue to be the best path towards economic efficiency and industry rationality, and Standards play a major role. Jonathan Davis, SEMI, San Jose, CA.

3D Integration
Silicon interposers: building blocks for 3D-ICs
Silicon interposers seem set to stay as a valid alternative implementation to full 3D-IC designs. Matthew Hogan, Mentor Graphics, Wilsonville, OR

Metrology
Metrology of epitaxial thin-films by advanced HRXRD and XRR
Using complementary metrology techniques, the authors determined the thickness, composition and relaxation of SiGe and Si:C layers. Paul Ryan, et al., Jordan Valley Semiconductors, Durham, UK

Defect Detection/Automation
Centralized automation control increases performance and reduces costs
The capabilities of advanced motion controllers enable OEMs to achieve high-performance requirements. Cameron Sheikholeslami, ACS Motion Control, Eden Prairie, MN

Technology News
Intel hits 22nm stride with trigates
Intel has taken the wraps off its next chip technology, a 22nm process utilizing a new 3D trigate architecture promising faster speeds and big power savings, which will ramp to volume manufacturing later this year.

IITC: BEOL beyond 22nm, CMOS-compatible CNTs
SST caught up with two presenters from this year’s IITC conference in Dresden to get more details about their interconnect technology research.

Free Download Solid State Technology Magazine June 2011

Geographic Eligibility: USA (Print or Digital), Canada, Mexico and International (Digital Only)

About Solid State Technology Magazine :
Solid State Technology is the most complete source of information for wafer fab engineers, operators, and managers; tools and materials suppliers; and semi-conductor researchers. It provides information on the latest process, equipment and materials technologies for semiconductor and thin-film device and microstructure manufacturing.

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